Publication detail

Calibration of the Deflection Field of the Lithograph Using SEM Mode

DANĚK, L.

Original Title

Calibration of the Deflection Field of the Lithograph Using SEM Mode

Type

conference paper

Language

English

Original Abstract

A new method for the calibration of geometric distortion of deflection field is presented. This method uses a regime of scanning electron microscope (SEM), which was added to electron beam lithographs BS600 and BS601 in project ELITO. The main advantage of this method was the reduction of the time required to calibrate the lithograph.

Key words in English

E-Beam Lithography

Authors

DANĚK, L.

RIV year

2004

Released

29. 4. 2004

Publisher

VUT v Brně

Location

Brno

ISBN

80-214-2636-5

Book

10. konference EEICT

Pages from

570

Pages to

574

Pages count

5

BibTex

@inproceedings{BUT13489,
  author="Lukáš {Daněk}",
  title="Calibration of the Deflection Field of the Lithograph Using SEM Mode",
  booktitle="10. konference EEICT",
  year="2004",
  volume="2004",
  pages="5",
  publisher="VUT v Brně",
  address="Brno",
  isbn="80-214-2636-5"
}