Publication detail

Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition

NARIMISA, M. KRČMA, F. ONYSHCHENKO, Y. KOZÁKOVÁ, Z. MORENT, R. DE GEYTER, N.

Original Title

Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition

Type

journal article in Web of Science

Language

English

Original Abstract

In this work, the potential of a microwave (MW)‐induced atmospheric pressure plasma jet (APPJ) in film deposition of styrene and methyl methacrylate (MMA) precursors is investigated. Plasma properties during the deposition and resultant coating characteristics are studied. Optical emission spectroscopy (OES) results indicate a higher degree of monomer dissociation in the APPJ with increasing power and a carrier gas flow rate of up to 250 standard cubic centimeters per minute (sccm). Computational fluid dynamic (CFD) simulations demonstrate non‐uniform monomer distribution near the substrate and the dependency of the deposition area on the monomercontaining gas flow rate. A non‐homogeneous surface morphology and topography of the deposited coatings is also observed using atomic force microscopy (AFM) and SEM. Coating chemical analysis and wettability are studied by XPS and water contact angle (WCA), respectively. A lower monomer flow rate was found to result in a higher C–O/C–C ratio and a higher wettability of the deposited coatings.

Keywords

atmospheric pressure plasma jet (APPJ); microwave (MW) discharge; thin film deposition; optical emission spectroscopy (OES); Comsol MultiPhysics; methyl methacrylate (MMA); styrene

Authors

NARIMISA, M.; KRČMA, F.; ONYSHCHENKO, Y.; KOZÁKOVÁ, Z.; MORENT, R.; DE GEYTER, N.

Released

6. 2. 2020

Publisher

MDPI

Location

Basel

ISBN

2073-4360

Periodical

Polymers

Year of study

12

Number

2

State

Swiss Confederation

Pages from

1

Pages to

23

Pages count

23

URL

https://www.mdpi.com/2073-4360/12/2/354

Full text in the Digital Library

http://hdl.handle.net/11012/195653

BibTex

@article{BUT165976,
  author="Mehrnoush {Narimisa} and František {Krčma} and Yuliia {Onyshchenko} and Zdenka {Kozáková} and Rino {Morent} and Nathalie {De Geyter}",
  title="Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition
",
  journal="Polymers",
  year="2020",
  volume="12",
  number="2",
  pages="1--23",
  doi="10.3390/polym12020354",
  issn="2073-4360",
  url="https://www.mdpi.com/2073-4360/12/2/354"
}