Publication detail

TEMPERATURE AND FREQUENCY DEPENDENCE OF COMPLEX PERMITTIVITY FOR NIOBIUM OXIDE FILM AT COMMERCIAL ELECTROLYTIC CAPACITOR

ABUETWIRAT, I. CHVÁTAL, M.

Original Title

TEMPERATURE AND FREQUENCY DEPENDENCE OF COMPLEX PERMITTIVITY FOR NIOBIUM OXIDE FILM AT COMMERCIAL ELECTROLYTIC CAPACITOR

Type

conference paper

Language

English

Original Abstract

The complex permittivity of thin oxide film at commercial niobium oxide capacitor was measured at different temperature range 218-373 K by using Janis cryostat system, with HP 4284A impedance analyzer with frequencies from 20 Hz to 1MHz. The real part of complex permittivity increases with temperature and decreases with frequency, the imaginary part of complex permittivity displays abroad maximum peak whose position shifts with temperature to a higher frequency region with an activation energy 0.055 eV. The measured imaginary parts of complex permittivity were studied by the graphical analysis of the obtained data as proposed by Havriliak -Negami (HN) equation.

Keywords

Real part of complex permittivity, imaginary part of complex permittivity, niobium oxide capacitor, Havriliak-Negami equation.

Authors

ABUETWIRAT, I.; CHVÁTAL, M.

RIV year

2012

Released

29. 8. 2012

Publisher

FEKT VUT Brno

Location

VSACKÝ CÁB

ISBN

978-80-214-4579-6

Book

Proceedings of the conference VSACKÝ CÁB 2012

Edition

1

Edition number

1

Pages from

4

Pages to

7

Pages count

4

BibTex

@inproceedings{BUT100593,
  author="Inas Faisel {Abuetwirat} and Miloš {Chvátal}",
  title="TEMPERATURE AND FREQUENCY DEPENDENCE OF COMPLEX PERMITTIVITY FOR NIOBIUM OXIDE FILM AT COMMERCIAL ELECTROLYTIC CAPACITOR",
  booktitle="Proceedings of the conference VSACKÝ CÁB 2012",
  year="2012",
  series="1",
  number="1",
  pages="4--7",
  publisher="FEKT VUT Brno",
  address="VSACKÝ CÁB",
  isbn="978-80-214-4579-6"
}