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ČECHAL, J. POLČÁK, J. ŠIKOLA, T.
Original Title
Detachment Limited Kinetics of Gold Diffusion through Ultrathin Oxide Layers
Type
journal article in Web of Science
Language
English
Original Abstract
Gold clusters and nanoparticles on ultrathin oxide layers are used as catalysts and represent essential parts of plasmonic and electronic devices. The stability of these nanostructures at surfaces against the diffusion of their constituents into the bulk is therefore of vital importance regarding their long-term applicability. Here, on the basis of in situ X-ray photoelectron spectroscopy measurements of gold diffusion through ultrathin oxide layers (SiO2 and Al2O3) to a Si substrate, we show that the diffusion from gold clusters/islands into the bulk is a detachment-limited process. Hence, the ultrathin oxide acts principally as a layer preventing a direct contact of metal atoms with the silicon substrate rather than a diffusion barrier. These findings contribute to a quantitative understanding of general design rules of metal/oxide structures.
Keywords
Oxide Layers; Diffusion; Gold Clusters; Nanoparticles, Atomic Layer Deposition, ALD; Surface Processes
Authors
ČECHAL, J.; POLČÁK, J.; ŠIKOLA, T.
RIV year
2014
Released
7. 8. 2014
ISBN
1932-7447
Periodical
Journal of Physical Chemistry C (print)
Year of study
118
Number
31
State
United States of America
Pages from
17549
Pages to
17555
Pages count
7
BibTex
@article{BUT108725, author="Jan {Čechal} and Josef {Polčák} and Tomáš {Šikola}", title="Detachment Limited Kinetics of Gold Diffusion through Ultrathin Oxide Layers", journal="Journal of Physical Chemistry C (print)", year="2014", volume="118", number="31", pages="17549--17555", doi="10.1021/jp5031703", issn="1932-7447" }