Publication detail

Detachment Limited Kinetics of Gold Diffusion through Ultrathin Oxide Layers

ČECHAL, J. POLČÁK, J. ŠIKOLA, T.

Original Title

Detachment Limited Kinetics of Gold Diffusion through Ultrathin Oxide Layers

Type

journal article in Web of Science

Language

English

Original Abstract

Gold clusters and nanoparticles on ultrathin oxide layers are used as catalysts and represent essential parts of plasmonic and electronic devices. The stability of these nanostructures at surfaces against the diffusion of their constituents into the bulk is therefore of vital importance regarding their long-term applicability. Here, on the basis of in situ X-ray photoelectron spectroscopy measurements of gold diffusion through ultrathin oxide layers (SiO2 and Al2O3) to a Si substrate, we show that the diffusion from gold clusters/islands into the bulk is a detachment-limited process. Hence, the ultrathin oxide acts principally as a layer preventing a direct contact of metal atoms with the silicon substrate rather than a diffusion barrier. These findings contribute to a quantitative understanding of general design rules of metal/oxide structures.

Keywords

Oxide Layers; Diffusion; Gold Clusters; Nanoparticles, Atomic Layer Deposition, ALD; Surface Processes

Authors

ČECHAL, J.; POLČÁK, J.; ŠIKOLA, T.

RIV year

2014

Released

7. 8. 2014

ISBN

1932-7447

Periodical

Journal of Physical Chemistry C (print)

Year of study

118

Number

31

State

United States of America

Pages from

17549

Pages to

17555

Pages count

7

BibTex

@article{BUT108725,
  author="Jan {Čechal} and Josef {Polčák} and Tomáš {Šikola}",
  title="Detachment Limited Kinetics of Gold Diffusion through Ultrathin Oxide Layers",
  journal="Journal of Physical Chemistry C (print)",
  year="2014",
  volume="118",
  number="31",
  pages="17549--17555",
  doi="10.1021/jp5031703",
  issn="1932-7447"
}