Publication detail

Deposition and in situ characterization of ultra-thin films

VOBORNÝ, S., KOLÍBAL, M., MACH, J., ČECHAL, J., BÁBOR, P., PRŮŠA, S., SPOUSTA, J., ŠIKOLA, T.

Original Title

Deposition and in situ characterization of ultra-thin films

Type

conference paper

Language

English

Original Abstract

Deposition of ultra-thin GaN layers and their analysis using XPS, SIMS, TOF-LEIS.

Key words in English

GaN, XPS, thin films

Authors

VOBORNÝ, S., KOLÍBAL, M., MACH, J., ČECHAL, J., BÁBOR, P., PRŮŠA, S., SPOUSTA, J., ŠIKOLA, T.

RIV year

2003

Released

23. 6. 2003

Publisher

EVC

Location

Berlin

Pages from

45

Pages to

46

Pages count

2

BibTex

@inproceedings{BUT11053,
  author="Stanislav {Voborný} and Miroslav {Kolíbal} and Jindřich {Mach} and Jan {Čechal} and Petr {Bábor} and Stanislav {Průša} and Jiří {Spousta} and Tomáš {Šikola}",
  title="Deposition and in situ characterization of ultra-thin films",
  booktitle="EVC'03 Abstracts",
  year="2003",
  pages="2",
  publisher="EVC",
  address="Berlin"
}