Publication detail

Interferometry and Atomic force microscopy of substrates for optoelectronics proceeded by dry plasma etching

DALLAEVA, D. PROKOPYEVA, E. TOMÁNEK, P. GRMELA, L. RAMAZANOV, S.

Original Title

Interferometry and Atomic force microscopy of substrates for optoelectronics proceeded by dry plasma etching

Type

conference paper

Language

English

Original Abstract

The paper describes the process of sapphire and silicon carbide substrates preparation by dry plasma etching and its characterization. The study confirms the possibility of using dry plasma etching processes for wide band gape materials treatment, since the condition of the substrate surface is an important parameter for electronic and optoelectronic devices manufacturing. Processed substrates were studied by interferometry to define the etch depth, and by atomic force microscopy to study the topography and statistical analysis of surface roughness before and after etching. The interferometry reveals the dependence of etch rate on the angle between the substrates and defocused beam of argon ions. It is also shown in low scale image that the surface damage occurs after the substrate treatment. But the common large area surface topography indicates the decreasing of roughness. In order to have purely physical etching the argon plasma was used. Thus this combination of methods allows determine optimal conditions of the substrate preparation.

Keywords

etching; sapphire; silicon carbide; substrate; interferometry; atomic force microscopy

Authors

DALLAEVA, D.; PROKOPYEVA, E.; TOMÁNEK, P.; GRMELA, L.; RAMAZANOV, S.

RIV year

2014

Released

5. 11. 2014

Publisher

IEEE Computer Society Press

Location

Los Alamitos, CA, USA

ISBN

978-1-4799-6666-0

Book

2014 International Symposium on Optomechatronic Technologies (ISOT 2014)

ISBN

1063-6900

Periodical

Proceedings. The Computer Security Foundations Workshop III

Year of study

2014

Number

1

State

United States of America

Pages from

283

Pages to

287

Pages count

5

BibTex

@inproceedings{BUT110784,
  author="Dinara {Sobola} and Elena {Prokopyeva} and Pavel {Tománek} and Lubomír {Grmela} and Shihgasan {Ramazanov}",
  title="Interferometry and Atomic force microscopy of substrates for optoelectronics proceeded by dry plasma etching",
  booktitle="2014 International Symposium on Optomechatronic Technologies (ISOT 2014)",
  year="2014",
  journal="Proceedings. The Computer Security Foundations Workshop III",
  volume="2014",
  number="1",
  pages="283--287",
  publisher="IEEE Computer Society Press",
  address="Los Alamitos, CA, USA",
  doi="10.1109/ISOT.2014.76",
  isbn="978-1-4799-6666-0",
  issn="1063-6900"
}