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KRBAL, M. PŘIKRYL, J. ZAZPE, R. DVOŘÁK, F. BUREŠ, F. MACÁK, J.
Original Title
2D MoSe2 Structures Prepared by Atomic Layer Deposition
Type
journal article in Web of Science
Language
English
Original Abstract
Here, we demonstrate the preparation of 2D MoSe2 structures by the atomic layer deposition technique. In this work, we use ((CH3)3Si)2Se as the Se precursor and Mo(CO)6 or MoCl5 as the Mo precursors. The X-ray photoelectron spectroscopy (XPS) analyses of the prepared samples have revealed that using the MoCl5 precursor the obtained structure of MoSe2 is nearly identical to the reference powder MoSe2 sample while the composition of the sample prepared from Mo(CO)6 contains a significant amount of oxygen atoms. Further inspection of as-deposited samples via scanning electron microscopy (SEM), X-ray diffraction (XRD), and Raman spectroscopy has disclosed that the MoSe2 structure based on MoCl5 is formed from randomly oriented well crystalline flakes with their size 100nm in contrast to the Mo–Se–O compact film originating from Mo(CO)6.
Keywords
atomic layer deposition, MoSe2, structure
Authors
KRBAL, M.; PŘIKRYL, J.; ZAZPE, R.; DVOŘÁK, F.; BUREŠ, F.; MACÁK, J.
Released
1. 5. 2018
ISBN
1862-6254
Periodical
Physica Status Solidi-Rapid Research Letters
Year of study
12
Number
5
State
Federal Republic of Germany
Pages from
1800023-1
Pages to
1800023-4
Pages count
4