Publication detail

2D MoSe2 Structures Prepared by Atomic Layer Deposition

KRBAL, M. PŘIKRYL, J. ZAZPE, R. DVOŘÁK, F. BUREŠ, F. MACÁK, J.

Original Title

2D MoSe2 Structures Prepared by Atomic Layer Deposition

Type

journal article in Web of Science

Language

English

Original Abstract

Here, we demonstrate the preparation of 2D MoSe2 structures by the atomic layer deposition technique. In this work, we use ((CH3)3Si)2Se as the Se precursor and Mo(CO)6 or MoCl5 as the Mo precursors. The X-ray photoelectron spectroscopy (XPS) analyses of the prepared samples have revealed that using the MoCl5 precursor the obtained structure of MoSe2 is nearly identical to the reference powder MoSe2 sample while the composition of the sample prepared from Mo(CO)6 contains a significant amount of oxygen atoms. Further inspection of as-deposited samples via scanning electron microscopy (SEM), X-ray diffraction (XRD), and Raman spectroscopy has disclosed that the MoSe2 structure based on MoCl5 is formed from randomly oriented well crystalline flakes with their size 100nm in contrast to the Mo–Se–O compact film originating from Mo(CO)6.

Keywords

atomic layer deposition, MoSe2, structure

Authors

KRBAL, M.; PŘIKRYL, J.; ZAZPE, R.; DVOŘÁK, F.; BUREŠ, F.; MACÁK, J.

Released

1. 5. 2018

ISBN

1862-6254

Periodical

Physica Status Solidi-Rapid Research Letters

Year of study

12

Number

5

State

Federal Republic of Germany

Pages from

1800023-1

Pages to

1800023-4

Pages count

4