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PAPEŽ, N. SOBOLA, D. GAJDOŠ, A. ŠKVARENINA, Ľ. MACKŮ, R. ELIÁŠ, M. NEBOJSA, A. MOTÚZ, R.
Original Title
Surface morphology after reactive ion etching of silicon and gallium arsenide based solar cells
Type
journal article in Scopus
Language
English
Original Abstract
This work aims to study the surface morphology of solar cells before and after reactive ion etching (RIE) at two different pressures. Two types of solar cell based on GaAs and polycrystalline Si were processed and compared. The Scanning Electron Microscope (SEM) with the Energy Dispersive X-ray spectroscopy (EDX) was used for analysis of the samples. Raman spectroscopy showed a structural fingerprint of materials before and after processing. Atomic Force Microscope (AFM) demonstrated dimensional topography with high resolution. Optical spectrometer detected changing of reflectance the samples. Experimentally, it has been confirmed that GaAs solar cells have a very high endurance to ion bombardment in comparison to Si cells.
Keywords
gallium arsenide, ion etching, rie, silicon, afm
Authors
PAPEŽ, N.; SOBOLA, D.; GAJDOŠ, A.; ŠKVARENINA, Ľ.; MACKŮ, R.; ELIÁŠ, M.; NEBOJSA, A.; MOTÚZ, R.
Released
1. 12. 2018
Publisher
IOP Publishing Ltd
ISBN
1742-6596
Periodical
Journal of Physics: Conference Series
Year of study
1124
Number
4
State
United Kingdom of Great Britain and Northern Ireland
Pages from
165
Pages to
171
Pages count
6
URL
http://iopscience.iop.org/article/10.1088/1742-6596/1124/4/041015
BibTex
@article{BUT151859, author="Nikola {Papež} and Dinara {Sobola} and Adam {Gajdoš} and Ľubomír {Škvarenina} and Robert {Macků} and Marek {Eliáš} and Alois {Nebojsa} and Rastislav {Motúz}", title="Surface morphology after reactive ion etching of silicon and gallium arsenide based solar cells", journal="Journal of Physics: Conference Series", year="2018", volume="1124", number="4", pages="165--171", doi="10.1088/1742-6596/1124/4/041015", issn="1742-6596", url="http://iopscience.iop.org/article/10.1088/1742-6596/1124/4/041015" }