Publication detail

The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning

GLOSS, J. HORKÝ, M. KŘIŽÁKOVÁ, V. FLAJŠMAN, L. SCHMID, M. URBÁNEK, M. VARGA, P.

Original Title

The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning

Type

journal article in Web of Science

Language

English

Original Abstract

We have studied the growth of metastable face-centered-cubic, non-magnetic Fe78Ni22 thin films on silicon substrates. These films undergo a magnetic (paramagnetic to ferromagnetic) and structural (fcc to bcc) phase transformation upon ion beam irradiation and thus can serve as a material for direct writing of magnetic nanostructures by the focused ion beam. So far, these films were prepared only on single-crystal Cu(1 0 0) substrates. We show that transformable Fe78Ni22 thin films can also be prepared on a hydrogen-terminated Si(1 0 0) with a 130-nm-thick Cu(1 0 0) buffer layer. The H-Si(1 0 0) substrates can be prepared by hydrofluoric acid etching or by annealing at 1200 degrees C followed by adsorption of atomic hydrogen. The Cu(1 0 0) buffer layer and Fe78Ni22 fcc metastable thin film were deposited by thermal evaporation in ultra-high vacuum. The films were consequently transformed in-situ by 4 keV Ar+ ion irradiation and ex-situ by a 30 keV Ga+ focused ion beam, and their magnetic properties were studied by magneto-optical Kerr effect magnetometry. The substitution of expensive copper single crystal substrate by standard silicon wafers dramatically expands application possibilities of metastable paramagnetic thin films for focused-ion-beam direct magnetic patterning.

Keywords

Magnetic nanostructures; Metastable films; fcc Fe; Cu buffer layer; Si(100)

Authors

GLOSS, J.; HORKÝ, M.; KŘIŽÁKOVÁ, V.; FLAJŠMAN, L.; SCHMID, M.; URBÁNEK, M.; VARGA, P.

Released

1. 3. 2019

Publisher

Elsevier

ISBN

0169-4332

Periodical

Applied Surface Science

Year of study

469

Number

1

State

Kingdom of the Netherlands

Pages from

747

Pages to

752

Pages count

6

URL

https://www.sciencedirect.com/science/article/pii/S0169433218330459?via%3Dihub

Full text in the Digital Library

http://hdl.handle.net/11012/180697

BibTex

@article{BUT155301,
  author="Jonáš {Gloss} and Michal {Horký} and Viola {Křižáková} and Lukáš {Flajšman} and Michael {Schmid} and Michal {Urbánek} and Peter {Varga}",
  title="The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning",
  journal="Applied Surface Science",
  year="2019",
  volume="469",
  number="1",
  pages="747--752",
  doi="10.1016/j.apsusc.2018.10.263",
  issn="0169-4332",
  url="https://www.sciencedirect.com/science/article/pii/S0169433218330459?via%3Dihub"
}