Publication detail

Selfordered Pore Structure of Anodized Alumina Thin Film on Si Substrate

HRDÝ, R., HUBÁLEK, J.

Original Title

Selfordered Pore Structure of Anodized Alumina Thin Film on Si Substrate

Type

conference paper

Language

English

Original Abstract

The purpose of our method is creating a template for electro deposition of nanowires directly on n-type Si substrate. The thickness of aluminum layer is 1-2 um. The first task was to find an efficient method for deposition of thin alumina film. The sputtering was found to be unsuitable for anodization process because nanocrytals had been created during the deposition of film. The creating of ordered pore structure failed. We found conditions in which aluminum layer is not dissolved during anodization before than pore structure is created.

Keywords

self-ordering, nanopores, anodization

Authors

HRDÝ, R., HUBÁLEK, J.

RIV year

2005

Released

15. 9. 2005

Publisher

Ing. Zdeněk Novoný, CSc.

ISBN

80-214-2990-9

Book

Electronic Devices and Systems IMAPS CS International Conference 2005

Edition number

1

Pages from

300

Pages to

303

Pages count

4

BibTex

@inproceedings{BUT15946,
  author="Radim {Hrdý} and Jaromír {Hubálek}",
  title="Selfordered Pore Structure of Anodized Alumina Thin Film on Si Substrate",
  booktitle="Electronic Devices and Systems IMAPS CS International Conference 2005",
  year="2005",
  number="1",
  pages="4",
  publisher="Ing. Zdeněk Novoný, CSc.",
  isbn="80-214-2990-9"
}