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BENDOVÁ, M. PYTLÍČEK, Z. PRÁŠEK, J. MOZALEV, A.
Original Title
The growth and unique electronic properties of the porous-alumina-assisted hafnium-oxide nanostructured films
Type
journal article in Web of Science
Language
English
Original Abstract
Hafnium-oxide nanostructures of controlled composition and properties are in demand for modern electronic and optical engineering. Here hafnium-oxide nanostructured films are synthesized on substrates via the anodizing/re-anodizing of a thin Hf layer through a porous anodic alumina (PAA) film in 0.2 M H3PO4 electrolyte and examined by SEM, EIS, and Mott-Schottky analysis. The films are composed of HfO nanorods, which grow in the pores, anchored to a continuous HfO2 bottom layer by tiny HfOx nanoroots penetrating the alumina barrier layer. The understanding of film nucleation and growth is advanced through disclosing the hidden features and field-assisted modifications of the metaloxide interfaces, such as O-2-filled nanosized voids and individual hafnium-oxide nanoroots dominating within the alumina barrier layer and securing electron transport to each nanorod. The films reveal a unique combination of electrical properties, such that the bottom oxide behaves like an ideal dielectric whereas the roots and rods show semiconducting behavior. Potential applications include high-k dielectrics for high-voltage electrolytic capacitors, semiconducting active layers for gas sensing, or photoanodes for photoelectrochemical water splitting.
Keywords
Porous anodic alumina; Hafnium oxide; Anodizing; Dielectric; Semiconductor
Authors
BENDOVÁ, M.; PYTLÍČEK, Z.; PRÁŠEK, J.; MOZALEV, A.
Released
10. 12. 2019
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Location
OXFORD
ISBN
0013-4686
Periodical
Electrochimica Acta
Year of study
327
Number
1
State
United Kingdom of Great Britain and Northern Ireland
Pages from
Pages to
12
Pages count
URL
https://www.sciencedirect.com/science/article/pii/S0013468619319000?via%3Dihub
BibTex
@article{BUT160882, author="Mária {Bendová} and Zdeněk {Pytlíček} and Jan {Prášek} and Alexander {Mozalev}", title="The growth and unique electronic properties of the porous-alumina-assisted hafnium-oxide nanostructured films", journal="Electrochimica Acta", year="2019", volume="327", number="1", pages="1--12", doi="10.1016/j.electacta.2019.135029", issn="0013-4686", url="https://www.sciencedirect.com/science/article/pii/S0013468619319000?via%3Dihub" }