Přístupnostní navigace
E-application
Search Search Close
Publication detail
KLEDROWETZ, V. HÁZE, J. PROKOP, R. FUJCIK, L.
Original Title
An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference
Type
journal article in Web of Science
Language
English
Original Abstract
A novel active resistor circuit offering less sensitivity to process and temperature variations without any extra trimming is proposed. The circuit consists of two accurately matched, high resistance polysilicon (hripoly) resistors and a voltage-controlled MOS resistor, and it is designed for the industrial temperature range (-20 degrees C to 85 degrees C) in the TSMC 180 nm general-purpose process. The actual performance of the circuit is analyzed by using the Corner and Monte Carlo analyses that comprise two thousand samples for the global and local process variations. The maximum error in the resistor value is +/- 6.2%, with the standard deviation of sigma = 12%. The proposed active resistor reduces the maximum error from +/- 15% to +/- 6.2% when the both the process and the temperature variations are considered without trimming. As an application, a transconductor and a current reference based on the novel active resistor are introduced, and their accuracy-related performance is studied.
Keywords
Active resistors; current reference; process variation; transconductor
Authors
KLEDROWETZ, V.; HÁZE, J.; PROKOP, R.; FUJCIK, L.
Released
29. 10. 2020
Publisher
IEEE
Location
PISCATAWAY
ISBN
2169-3536
Periodical
IEEE Access
Year of study
8
Number
1
State
United States of America
Pages from
197263
Pages to
197275
Pages count
13
URL
https://ieeexplore.ieee.org/document/9244063
Full text in the Digital Library
http://hdl.handle.net/11012/196478
BibTex
@article{BUT165887, author="Vilém {Kledrowetz} and Jiří {Háze} and Roman {Prokop} and Lukáš {Fujcik}", title="An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference", journal="IEEE Access", year="2020", volume="8", number="1", pages="197263--197275", doi="10.1109/ACCESS.2020.3034790", issn="2169-3536", url="https://ieeexplore.ieee.org/document/9244063" }