Publication detail

An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference

KLEDROWETZ, V. HÁZE, J. PROKOP, R. FUJCIK, L.

Original Title

An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference

Type

journal article in Web of Science

Language

English

Original Abstract

A novel active resistor circuit offering less sensitivity to process and temperature variations without any extra trimming is proposed. The circuit consists of two accurately matched, high resistance polysilicon (hripoly) resistors and a voltage-controlled MOS resistor, and it is designed for the industrial temperature range (-20 degrees C to 85 degrees C) in the TSMC 180 nm general-purpose process. The actual performance of the circuit is analyzed by using the Corner and Monte Carlo analyses that comprise two thousand samples for the global and local process variations. The maximum error in the resistor value is +/- 6.2%, with the standard deviation of sigma = 12%. The proposed active resistor reduces the maximum error from +/- 15% to +/- 6.2% when the both the process and the temperature variations are considered without trimming. As an application, a transconductor and a current reference based on the novel active resistor are introduced, and their accuracy-related performance is studied.

Keywords

Active resistors; current reference; process variation; transconductor

Authors

KLEDROWETZ, V.; HÁZE, J.; PROKOP, R.; FUJCIK, L.

Released

29. 10. 2020

Publisher

IEEE

Location

PISCATAWAY

ISBN

2169-3536

Periodical

IEEE Access

Year of study

8

Number

1

State

United States of America

Pages from

197263

Pages to

197275

Pages count

13

URL

Full text in the Digital Library

BibTex

@article{BUT165887,
  author="Vilém {Kledrowetz} and Jiří {Háze} and Roman {Prokop} and Lukáš {Fujcik}",
  title="An Active Resistor With a Lower Sensitivity to Process Variations, and its Application in Current Reference",
  journal="IEEE Access",
  year="2020",
  volume="8",
  number="1",
  pages="197263--197275",
  doi="10.1109/ACCESS.2020.3034790",
  issn="2169-3536",
  url="https://ieeexplore.ieee.org/document/9244063"
}