Publication detail

SEM Observation of Multilayer Semiconductor Structures Using Different Detection Modes

Petr Wandrol, Jiřina Matějková, Rudolf Autrata

Original Title

SEM Observation of Multilayer Semiconductor Structures Using Different Detection Modes

Type

conference paper

Language

English

Original Abstract

Manufacturing of semiconductor devices especially chips is a very exact process susceptible to errors and therefore the detailed inspection and failure analysis is necessary. One of the non-destructive testing instruments is the Scanning Electron Microscope (SEM). The negative charging of the specimen is the main difficulty in the observation and imaging of semiconductor structures in the SEM. The influence of the semiconductor specimen charging on the quality of image provided by different detection systems was the goal of this contribution.

Keywords

Multilayer Semiconductor Structures, SEM, detection

Authors

Petr Wandrol, Jiřina Matějková, Rudolf Autrata

RIV year

2005

Released

28. 8. 2005

Publisher

Paul Scherrer Institut

Location

Davos

Pages from

339

Pages to

339

Pages count

1

BibTex

@inproceedings{BUT16652,
  author="Petr {Wandrol} and Jiřina {Matějková} and Rudolf {Autrata}",
  title="SEM Observation of Multilayer Semiconductor Structures Using Different Detection Modes",
  booktitle="PSI Proceedings of Dreilandertagung Microscopy Conference 2005",
  year="2005",
  volume="05",
  number="01",
  pages="1",
  publisher="Paul Scherrer Institut",
  address="Davos"
}