Detail publikace

SEM Observation of Multilayer Semiconductor Structures Using Different Detection Modes

Petr Wandrol, Jiřina Matějková, Rudolf Autrata

Originální název

SEM Observation of Multilayer Semiconductor Structures Using Different Detection Modes

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

Manufacturing of semiconductor devices especially chips is a very exact process susceptible to errors and therefore the detailed inspection and failure analysis is necessary. One of the non-destructive testing instruments is the Scanning Electron Microscope (SEM). The negative charging of the specimen is the main difficulty in the observation and imaging of semiconductor structures in the SEM. The influence of the semiconductor specimen charging on the quality of image provided by different detection systems was the goal of this contribution.

Klíčová slova

Multilayer Semiconductor Structures, SEM, detection

Autoři

Petr Wandrol, Jiřina Matějková, Rudolf Autrata

Rok RIV

2005

Vydáno

28. 8. 2005

Nakladatel

Paul Scherrer Institut

Místo

Davos

Strany od

339

Strany do

339

Strany počet

1

BibTex

@inproceedings{BUT16652,
  author="Petr {Wandrol} and Jiřina {Matějková} and Rudolf {Autrata}",
  title="SEM Observation of Multilayer Semiconductor Structures Using Different Detection Modes",
  booktitle="PSI Proceedings of Dreilandertagung Microscopy Conference 2005",
  year="2005",
  volume="05",
  number="01",
  pages="1",
  publisher="Paul Scherrer Institut",
  address="Davos"
}