Publication detail

Observation of Multilayer Semiconductor Structures in the Scanning Electron Microscope

P. Wandrol, J. Matějková, R. Autrata

Original Title

Observation of Multilayer Semiconductor Structures in the Scanning Electron Microscope

Type

conference paper

Language

English

Original Abstract

Scanning Electron Microscopes (SEMs) have been used for various applications in the semiconductor industry. Observation of the cross section of semiconductor devices can give important information about the layer structure, film thicknesses and the defects localization. The way to obtain more information about the multilayer semiconductor structure is observation using SEM with various detection modes. The aim of this contribution is to give information about the detection modes used to the visualization of semiconductor structures in the SEM.

Keywords

Scanning Electron Microscope, semiconductor structures

Authors

P. Wandrol, J. Matějková, R. Autrata

RIV year

2005

Released

1. 1. 2005

Publisher

Vysoké učení technické v Brně

Location

Brno

ISBN

80-214-2990-9

Book

Proceedings of IMAPS CS International Conference 2005

Edition number

1

Pages from

248

Pages to

250

Pages count

3

BibTex

@inproceedings{BUT16655,
  author="Petr {Wandrol} and Jiřina {Matějková} and Rudolf {Autrata}",
  title="Observation of Multilayer Semiconductor Structures in the Scanning Electron Microscope",
  booktitle="Proceedings of IMAPS CS International Conference 2005",
  year="2005",
  number="1",
  pages="3",
  publisher="Vysoké učení technické v Brně",
  address="Brno",
  isbn="80-214-2990-9"
}