Detail publikace

Observation of Multilayer Semiconductor Structures in the Scanning Electron Microscope

P. Wandrol, J. Matějková, R. Autrata

Originální název

Observation of Multilayer Semiconductor Structures in the Scanning Electron Microscope

Typ

článek ve sborníku ve WoS nebo Scopus

Jazyk

angličtina

Originální abstrakt

Scanning Electron Microscopes (SEMs) have been used for various applications in the semiconductor industry. Observation of the cross section of semiconductor devices can give important information about the layer structure, film thicknesses and the defects localization. The way to obtain more information about the multilayer semiconductor structure is observation using SEM with various detection modes. The aim of this contribution is to give information about the detection modes used to the visualization of semiconductor structures in the SEM.

Klíčová slova

Scanning Electron Microscope, semiconductor structures

Autoři

P. Wandrol, J. Matějková, R. Autrata

Rok RIV

2005

Vydáno

1. 1. 2005

Nakladatel

Vysoké učení technické v Brně

Místo

Brno

ISBN

80-214-2990-9

Kniha

Proceedings of IMAPS CS International Conference 2005

Číslo edice

1

Strany od

248

Strany do

250

Strany počet

3

BibTex

@inproceedings{BUT16655,
  author="Petr {Wandrol} and Jiřina {Matějková} and Rudolf {Autrata}",
  title="Observation of Multilayer Semiconductor Structures in the Scanning Electron Microscope",
  booktitle="Proceedings of IMAPS CS International Conference 2005",
  year="2005",
  number="1",
  pages="3",
  publisher="Vysoké učení technické v Brně",
  address="Brno",
  isbn="80-214-2990-9"
}