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Balram, KC. Westly, DA. Davanco, M. Grutter, KE. Li, Q. Michels, T. Ray, CH. Yu, L. Kasica, RJ. Wallin, CB. Gilbert, IJ. Bryce, BA. Simelgor, G. Topolancik, J. Lobontiu, N. Liu, Y. Neuzil, P. Svatos, V. Dill, KA. Bertrand, NA. Metzler, M. Lopez, G. Czaplewski, DA. Ocola, L. Srinivasan, KA. Stavis, S. Aksyuk, VA. Liddle, JA. Krylov, S. Ilic, BR.
Original Title
Nanolithography Toolbox: Device design at the nanoscale
Type
conference paper
Language
English
Original Abstract
We have developed a platform-independent software package for designing nanometer scaled device architectures. The Nanolithography Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.
Keywords
LITHOGRAPHY; RESOLUTION; PLATFORM
Authors
Balram, KC.; Westly, DA.; Davanco, M.; Grutter, KE.; Li, Q.; Michels, T.; Ray, CH.; Yu, L.; Kasica, RJ.; Wallin, CB.; Gilbert, IJ.; Bryce, BA.; Simelgor, G.; Topolancik, J.; Lobontiu, N.; Liu, Y.; Neuzil, P.; Svatos, V.; Dill, KA.; Bertrand, NA.; Metzler, M.; Lopez, G.; Czaplewski, DA.; Ocola, L.; Srinivasan, KA.; Stavis, S.; Aksyuk, VA.; Liddle, JA.; Krylov, S.; Ilic, BR.
Released
14. 5. 2017
ISBN
978-1-9435-8027-9
Book
2017 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO)
Pages from
1
Pages to
2
Pages count
BibTex
@inproceedings{BUT170237, author="Balram, KC. and Westly, DA. and Davanco, M. and Grutter, KE. and Li, Q. and Michels, T. and Ray, CH. and Yu, L. and Kasica, RJ. and Wallin, CB. and Gilbert, IJ. and Bryce, BA. and Simelgor, G. and Topolancik, J. and Lobontiu, N. and Liu, Y. and Neuzil, P. and Svatos, V. and Dill, KA. and Bertrand, NA. and Metzler, M. and Lopez, G. and Czaplewski, DA. and Ocola, L. and Srinivasan, KA. and Stavis, S. and Aksyuk, VA. and Liddle, JA. and Krylov, S. and Ilic, BR.", title="Nanolithography Toolbox: Device design at the nanoscale", booktitle="2017 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO)", year="2017", pages="1--2", isbn="978-1-9435-8027-9" }