Přístupnostní navigace
E-application
Search Search Close
Publication detail
PEJCHAL, T. BUKVIŠOVÁ, K. VALLEJOS VARGAS, S. CITTERBERG, D. ŠIKOLA, T. KOLÍBAL, M.
Original Title
Ga interaction with ZnO surfaces: Diffusion and melt-back etching
Type
journal article in Web of Science
Language
English
Original Abstract
Despite being technologically very attractive, highly-doped zinc oxide whiskers with precisely defined morphology and doping level are difficult to prepare. Here, as an advancing step towards this goal, we show that pre-annealing of ZnO in oxygen-poor conditions (e.g. high vacuum) at low temperature encourages a deeper diffusion of Ga into the ZnO crystal lattice in contrast to ZnO pre-annealed in oxygen-rich conditions. We also demonstrate that gallium acts as a reactant causing ZnO etching at diffusion temperatures, contrary to Al-based doping of ZnO systems. This behaviour, being similar to gallium melt-back etching during GaN epitaxy on silicon, has not been observed for ZnO so far and can represent a significant hurdle for the post-growth diffusion doping of ZnO nanostructures. The paper suggests possible ways how to diminish this effect.
Keywords
ZnO whiskers; Gallium; Diffusion doping; Melt-back etching; XPS; Oxygen vacancy
Authors
PEJCHAL, T.; BUKVIŠOVÁ, K.; VALLEJOS VARGAS, S.; CITTERBERG, D.; ŠIKOLA, T.; KOLÍBAL, M.
Released
1. 5. 2022
ISBN
0169-4332
Periodical
Applied Surface Science
Year of study
583
Number
1
State
Kingdom of the Netherlands
Pages from
152475
Pages to
Pages count
6
URL
https://doi.org/10.1016/j.apsusc.2022.152475
BibTex
@article{BUT176542, author="Tomáš {Pejchal} and Kristýna {Bukvišová} and Stella {Vallejos Vargas} and Daniel {Citterberg} and Tomáš {Šikola} and Miroslav {Kolíbal}", title="Ga interaction with ZnO surfaces: Diffusion and melt-back etching", journal="Applied Surface Science", year="2022", volume="583", number="1", pages="152475--152475", doi="10.1016/j.apsusc.2022.152475", issn="0169-4332", url="https://doi.org/10.1016/j.apsusc.2022.152475" }