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Fourneau, E.; Arregi, J.A.; Barrera, A.; Nguyen, ND.; Bending, S.; Sanchez, A.; Uhlir, V.; Palau, A.; Silhanek, A.V.
Original Title
Microscale Metasurfaces for On-Chip Magnetic Flux Concentration
English Title
Type
WoS Article
Original Abstract
Magnetic metamaterials have demonstrated promising perspectives to improve the efficiency of magnetic flux concentrators. In this work, the effects of downscaling these devices for on-chip integration is investigated. The influence of the non-linear magnetic response of the ferromagnetic components, their magnetic irreversibility, the formation of magnetic domains, as well as the effects of geometry and size of the devices are scrutinized. The results demonstrate that the implementation of metasurfaces at the microscale opens up new technological possibilities for enhancing the performance of magnetic field detectors and remotely charging small electric devices, thus paving the way toward new approaches in information and communication technologies.
English abstract
Keywords
magnetic flux concentrators; metamaterials; metasurfaces; micromagnetism
Key words in English
Authors
RIV year
2024
Released
25.08.2023
Publisher
WILEY
Location
HOBOKEN
ISBN
2365-709X
Periodical
Advanced Materials Technologies
Volume
8
Number
16
State
United States of America
Pages from
1
Pages to
9
Pages count
URL
https://onlinelibrary.wiley.com/doi/10.1002/admt.202300177
BibTex
@article{BUT183976, author="Fourneau, E. and Arregi, J.A. and Barrera, A. and Nguyen, ND. and Bending, S. and Sanchez, A. and Uhlir, V. and Palau, A. and Silhanek, A.V.", title="Microscale Metasurfaces for On-Chip Magnetic Flux Concentration", journal="Advanced Materials Technologies", year="2023", volume="8", number="16", pages="1--9", doi="10.1002/admt.202300177", issn="2365-709X", url="https://onlinelibrary.wiley.com/doi/10.1002/admt.202300177" }