Publication detail

Nanometer - Thick titanium film as a silicon migration barrier

FAWAEER, S. AL-QAISI, W. SEDLÁKOVÁ, V. TRUNEC, M. SOBOLA, D. MOUSA, M.

Original Title

Nanometer - Thick titanium film as a silicon migration barrier

Type

journal article in Web of Science

Language

English

Original Abstract

Diffusion of silicon atoms to the topmost film surface poses significant challenges in various technological applications. In an effort to address this issue, titanium films with varying thicknesses were deposited on a silicon substrate to evaluate the efficacy of a thin titanium barrier film in blocking silicon migration to the upper film surface. Subsequently, the films were subjected to a 1-hour heating process in air at an oxidizing temperature of 430 K. Atomic force microscopy and Raman spectroscopy were employed to characterize the morphological and structural changes among the investigated films. X-ray photoelectron spectroscopy was utilized to explore variations in chemical composition, determine oxidation states, and measure the thicknesses of the thin titanium oxide layers. The findings revealed that titanium films with a thickness < 50 nm experienced silicon diffusion to their upper film surface. Moreover, an increase in the thickness of the oxide layers over the titanium film on the silicon substrate significantly reduced the migration of silicon to the titanium film surface. At 430 K, the study found that oxide layers at least 6.87 nm thick formed on a 35-nm thick titanium layer, which together successfully prevented silicon migration to the top surface of the film.

Keywords

Diffusion barrier; Migration barrier; Silicon substrate; Titanium film; Titanium oxide film layer

Authors

FAWAEER, S.; AL-QAISI, W.; SEDLÁKOVÁ, V.; TRUNEC, M.; SOBOLA, D.; MOUSA, M.

Released

1. 8. 2024

Publisher

ELSEVIER

Location

AMSTERDAM

ISBN

2352-4928

Periodical

Materials Today Communications

Year of study

40

Number

August 2024

State

United Kingdom of Great Britain and Northern Ireland

Pages from

1

Pages to

17

Pages count

17

URL

https://www.sciencedirect.com/science/article/pii/S2352492824013072

BibTex

@article{BUT189885,
  author="Saleh Hekmat Saleh {Fawaeer} and Wala' {Al-Qaisi} and Vlasta {Sedláková} and Marwan S. Mousa {Mousa} and Martin {Trunec} and Dinara {Sobola}",
  title="Nanometer - Thick titanium film as a silicon migration barrier",
  journal="Materials Today Communications",
  year="2024",
  volume="40",
  number="August 2024",
  pages="1--17",
  doi="10.1016/j.mtcomm.2024.109326",
  issn="2352-4928",
  url="https://www.sciencedirect.com/science/article/pii/S2352492824013072"
}