Publication detail

Wettability of plasma-polymerized vinyltriethoxysilane and tetravinylsilane films

LICHOVNÍKOVÁ, S. SOVA, J. STUDÝNKA, J. ČECH, V.

Original Title

Wettability of plasma-polymerized vinyltriethoxysilane and tetravinylsilane films

Type

conference paper

Language

English

Original Abstract

Organosilicone plasma polymer films are tested as compatible interlayers for multicomponent materials, where one of the components is silicon dioxide. Wettability together with functional groups at the film surface are the key material characteristics for constitution of chemical bonding to another component. Vinyltriethoxysilane (VTES) and tetravinylsilane (TVS) monomers were used for deposition of thin films by plasma-enhanced chemical vapor deposition (PE CVD) technique. Introduction of oxygen-containing species at the film surfaces is known to improve wettability and thus oxygen gas was mixed in tetravinylsilane to prepare hydrogenated amorphous silicon oxycarbide (a-SiOC:H) films with vinyl groups as functional species. Plasma-polymerized VTES and TVS/O2 films were deposited on glass and IR-transparent silicon wafers at different effective power (0.1 - 25 W) and oxygen content in the mixture (4 - 79%) using RF (13.56 MHz) pulsed plasma. The method of sessile drop was employed to characterize wettability of films and contact angles were measured using distilled water, glycerol, formamide, and methylene iodide as the probe liquids. The surface free energy, as well as the dispersive and polar components, was evaluated using the approach of Owens-Wendt geometrical mean method and Wu harmonic mean method. Van Oss, Good and Chaudhury acid-base theory enabled us to determine the Lifshitz-van der Waals and the acid-base components. Values of the surface free energy and its components were correlated with surface elemental composition and chemical structure of films analyzed by X-ray photoelectron spectroscopy (XPS) and infrared spectroscopy (FTIR). An influence of deposition conditions on the surface free energy of plasma polymer films will be demonstrated in the study (Fig. 1). Wettability of films seemed to increase with enhanced effective power especially due to an increased concentration of the side polar groups.

Keywords

Contact angle, plasma polymerization, thin film, FTIR, XPS

Authors

LICHOVNÍKOVÁ, S.; SOVA, J.; STUDÝNKA, J.; ČECH, V.

RIV year

2007

Released

13. 12. 2007

Pages from

1

Pages to

2

Pages count

2

BibTex

@inproceedings{BUT28345,
  author="Soňa {Kontárová} and Jiří {Sova} and Jan {Studýnka} and Vladimír {Čech}",
  title="Wettability of plasma-polymerized vinyltriethoxysilane and tetravinylsilane films",
  booktitle="New Perspectives of Plasma Science and Technology (CD medium)",
  year="2007",
  pages="1--2"
}