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HRDÝ, R. MACHÁČKOVÁ, M. DRBOHLAVOVÁ, J. HUBÁLEK, J.
Original Title
Fabrication of Anodized Porous Alumina on Thin Film Annealed at Different Temperatures
Type
conference paper
Language
English
Original Abstract
This work is focused on the effect of thin evaporated aluminum film anneling at different temperatures. In our case, the P-type silicon wafers were used as substrate for evaporation of pure aluminum. Then, each wafer was annealed in nitrogen atmosphere at temperature range of 300-400 Celsius degree. All samples were analyzed by SEM and AFM.
Keywords
anodization, alumina, annealing, crystal structure
Authors
HRDÝ, R.; MACHÁČKOVÁ, M.; DRBOHLAVOVÁ, J.; HUBÁLEK, J.
RIV year
2008
Released
10. 9. 2009
Publisher
Ing. Zdeněk Novotný, CSc.
Location
Brno
ISBN
978-80-214-3717-3
Book
EDS 09 IMAPS CS International Conference Proceedings
Edition number
1
Pages from
214
Pages to
218
Pages count
5
BibTex
@inproceedings{BUT30083, author="Radim {Hrdý} and Marina {Macháčková} and Jana {Drbohlavová} and Jaromír {Hubálek}", title="Fabrication of Anodized Porous Alumina on Thin Film Annealed at Different Temperatures", booktitle="EDS 09 IMAPS CS International Conference Proceedings", year="2009", number="1", pages="214--218", publisher="Ing. Zdeněk Novotný, CSc.", address="Brno", isbn="978-80-214-3717-3" }