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VOBORNÝ, S., ZLÁMAL, J., BÁBOR, P.
Original Title
Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics
Type
conference paper
Language
English
Original Abstract
Direct Ion Beam Deposition is an advanced method for processing of thin films. Apparatus for this technique was developed in the Institute of Physical Engineering. The experiments with direct ion beam deposition showed necessity of improving ion optics. In this contribution, some results of ion beam optimization are presented and discussed.
Key words in English
Deposition, Ion source
Authors
RIV year
2001
Released
19. 9. 2001
Publisher
Fakulta strojního inženýrství VUT v Brně
Location
Brno
Pages from
281
Pages to
282
Pages count
2
BibTex
@inproceedings{BUT3359, author="Stanislav {Voborný} and Jakub {Zlámal} and Petr {Bábor}", title="Deposition of Ultrathin Films - Optimalisation of Ion Beam Optics", booktitle="Juniormat '01 sborník", year="2001", pages="2", publisher="Fakulta strojního inženýrství VUT v Brně", address="Brno" }