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OHLÍDAL, M., OHLÍDAL, I., FRANTA, D., KRÁLÍK, T., JÁKL, M., ELIÁŠ, M.
Original Title
Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method
Type
journal article - other
Language
English
Original Abstract
An original method enabling us to characterize the non-uniformity of thin-film thickness is decribed. This method employs the interpretation of data obtained by multiple-wavelength reflectometry. The values of the reflectance are measured for several wavelengths in many points lying along the area of the film. The spectral dependence of the refractive index of the material forming the film is determined using variable-angle spectroscopic ellipsometry.
Key words in English
non-uniform thin films, optical characterization
Authors
RIV year
2002
Released
1. 8. 2002
ISBN
0142-2421
Periodical
Surface and Interface Analysis
Year of study
34
Number
1
State
United Kingdom of Great Britain and Northern Ireland
Pages from
660
Pages to
663
Pages count
4
BibTex
@article{BUT40936, author="Miloslav {Ohlídal} and Ivan {Ohlídal} and Daniel {Franta} and Tomáš {Králík} and Miloš {Jákl} and Marek {Eliáš}", title="Optical characterization of thin films non-uniform in thickness by a multiple-wavelength reflectance method", journal="Surface and Interface Analysis", year="2002", volume="34", number="1", pages="4", issn="0142-2421" }