Publication detail

New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

OHLÍDAL, M., OHLÍDAL, I., KLAPETEK, P., JÁKL, M., ČUDEK, V., ELIÁŠ, M.

Original Title

New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

Type

journal article - other

Language

English

Original Abstract

A new optical method for characterizing thin films exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of reflectance measured using the special experimental arrangement described in detail. Using the method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin film studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the film studied.

Keywords

films nonuniform in optical parameters, optical characterization

Authors

OHLÍDAL, M., OHLÍDAL, I., KLAPETEK, P., JÁKL, M., ČUDEK, V., ELIÁŠ, M.

RIV year

2003

Released

1. 7. 2003

ISBN

0021-4922

Periodical

Japanese Journal of Applied Physics

Year of study

2003

Number

7B

State

Japan

Pages from

4760

Pages to

4763

Pages count

4

BibTex

@article{BUT42041,
  author="Miloslav {Ohlídal} and Ivan {Ohlídal} and Petr {Klapetek} and Miloš {Jákl} and Vladimír {Čudek} and Marek {Eliáš}",
  title="New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters",
  journal="Japanese Journal of Applied Physics",
  year="2003",
  volume="2003",
  number="7B",
  pages="4",
  issn="0021-4922"
}