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Samek O, Leis F, Margetic V, Malina R, Niemax K, Hergenroder R
Original Title
Imaging of the expansion of femtosecond-laser-produced silicon plasma atoms by off-resonant planar laser-induced fluorescence
Type
journal article - other
Language
English
Original Abstract
Planar laser-induced fluorescence measurements were used to investigate the expansion dynamics of a femtosecond laser-induced plasma. Temporally and spatially resolved measurements were performed to monitor the atoms that were ablated from a silicon target. A dye laser (lambda = 288.16 nm) was used to excite fluorescence signals. The radiation of an off-resonant transition (Si 390.55 nm) was observed at different distances from the target surface. This allowed easy detection of the ablated Si atoms without problems caused by scattered laser light. Abel inversion was applied to obtain the radial distribution of the Si atoms. The atom distribution in the plasma shows some peculiarities, depending on the crater depth. (C) 2003 Optical Society of America.
Keywords
ABLATED COPPER, INDUCED BREAKDOWN, PLUME, EMISSION, GAS, SPECTROSCOPY, EXCITATION, DEPOSITION, CU-2, SI
Authors
RIV year
2003
Released
20. 10. 2003
ISBN
0003-6935
Periodical
Applied Optics
Year of study
42
Number
30
State
United States of America
Pages from
6001
Pages to
6005
Pages count
5
BibTex
@article{BUT42060, author="Ota {Samek} and Radomír {Malina}", title="Imaging of the expansion of femtosecond-laser-produced silicon plasma atoms by off-resonant planar laser-induced fluorescence", journal="Applied Optics", year="2003", volume="42", number="30", pages="5", issn="0003-6935" }