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VOBORNÝ, S. MACH, J. ČECHAL, J. KOSTELNÍK, P. TOMANEC, O. BÁBOR, P. SPOUSTA, J. ŠIKOLA, T.
Original Title
Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth
Type
journal article - other
Language
English
Original Abstract
Paper deals with the application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth
Key words in English
Ga, GaN, deposition, XPS
Authors
VOBORNÝ, S.; MACH, J.; ČECHAL, J.; KOSTELNÍK, P.; TOMANEC, O.; BÁBOR, P.; SPOUSTA, J.; ŠIKOLA, T.
RIV year
2004
Released
1. 1. 2004
ISBN
0447-6441
Periodical
Jemná mechanika a optika
Year of study
9
Number
State
Czech Republic
Pages from
265
Pages to
269
Pages count
5
BibTex
@article{BUT42366, author="Stanislav {Voborný} and Jindřich {Mach} and Jan {Čechal} and Petr {Kostelník} and Ondřej {Tomanec} and Petr {Bábor} and Jiří {Spousta} and Tomáš {Šikola}", title="Application of Complex UHV Apparaturus in a Study of Low-tepmerature Gallium-nitride Ultrathin Film Growth", journal="Jemná mechanika a optika", year="2004", volume="9", number="9", pages="5", issn="0447-6441" }