Publication detail

Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam

RITUCCI, A. –TOMASSETTI, G. –REALE, A. –ARIZZA, L. –ZUPELLA, P. –REALE, L. –PALLADINO, L.–FLORA, F. –BONFIGLI, E. –FAENOV, A. –PIKUZ, T. –KAISER, J. –NILSEN, J. –JANKOWSKI, A.F.

Original Title

Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam

Type

journal article - other

Language

English

Original Abstract

We applied a 0.3 mJ, 1.7 ns, 46.9 nm soft X-ray argon laser to ablate the surface of large bandgap dielectrics:CaF2 and LiF crystals.

Key words in English

46.9 nm soft X-ray laser, laser ablation

Authors

RITUCCI, A. –TOMASSETTI, G. –REALE, A. –ARIZZA, L. –ZUPELLA, P. –REALE, L. –PALLADINO, L.–FLORA, F. –BONFIGLI, E. –FAENOV, A. –PIKUZ, T. –KAISER, J. –NILSEN, J. –JANKOWSKI, A.F.

RIV year

2006

Released

1. 1. 2006

ISBN

0146-9592

Periodical

OPTICS LETTERS

Year of study

31

Number

1

State

United States of America

Pages from

68

Pages to

70

Pages count

3

BibTex

@article{BUT42576,
  author="Jozef {Kaiser}",
  title="Damage and ablation of large bandgap dielectrics induced by a 46.9 nm laser beam",
  journal="OPTICS LETTERS",
  year="2006",
  volume="31",
  number="1",
  pages="3",
  issn="0146-9592"
}