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ČECHAL, J. MACH, J. VOBORNÝ, S. KOSTELNÍK, P. BÁBOR, P. SPOUSTA, J. ŠIKOLA, T.
Original Title
A study of Ga layers on Si(100)-(2x1) by SR-PES: influence of adsorbed water
Type
journal article - other
Language
English
Original Abstract
Results for deposition and thermal annealing of gallium on the Si(100)-(2x1) surface achieved by synchrotron radiation photoelectron spectroscopy (SR-PES) and low energy electron diffraction (LEED) are presented. In addition to deposition of Ga on a clean surface, the influence of water adsorption on the arrangement of gallium atoms was also studied. The results on Ga deposition at a higher temperature (490 C) are consistent with a Ga ad-dimer model showing equivalent bond arrangement of all Ga atoms for coverages up to 0.5 ML. The deposition onto a surface with adsorbed water at room temperature led to a disordered gallium growth. In this case gallium atoms bind to silicon dimers already binding fragments of adsorbed water. A subsequent annealing of these layers leads to a surface structure similar to the Ga-(2x2), however, it is less ordered, probably due to the presence of silicon oxides formed from water fragments.
Keywords
Gallium; Ga; Silicon; Si(100); Water; Surface structure; Low energy electron diffraction (LEED); Synchrotron radiation photoelectron spectroscopy
Authors
ČECHAL, J.; MACH, J.; VOBORNÝ, S.; KOSTELNÍK, P.; BÁBOR, P.; SPOUSTA, J.; ŠIKOLA, T.
RIV year
2007
Released
1. 5. 2007
ISBN
0039-6028
Periodical
Surface Science
Year of study
601
Number
9
State
Kingdom of the Netherlands
Pages from
2047
Pages to
2053
Pages count
7
BibTex
@article{BUT43424, author="Jan {Čechal} and Jindřich {Mach} and Stanislav {Voborný} and Petr {Kostelník} and Petr {Bábor} and Jiří {Spousta} and Tomáš {Šikola}", title="A study of Ga layers on Si(100)-(2x1) by SR-PES: influence of adsorbed water", journal="Surface Science", year="2007", volume="601", number="9", pages="2047--2053", issn="0039-6028" }