Publication detail

Residual Reflectivity of Amplification Media for Extended-Cavity Laser

RŮŽIČKA, B., WILFERT, O.

Original Title

Residual Reflectivity of Amplification Media for Extended-Cavity Laser

Type

conference paper

Language

English

Original Abstract

This contribution presents experimental results obtained by deposition double-layer system made by means of electron-beam vacuum evaporation technique. We oriented our effort to short-wavelength 633 - 635 nm laser diodes. These devices are emitting close to the wavelength of traditional He-Ne lasers with an intention to use them in extended-cavity laser design for metrological purposes. The resulting reflectivities were evaluated by measuring a testing plate of GaAs and by measuring a "modulation depth" of a coated diode emission spectra. Our best results were reflectivities well below 10-4 and the repeatibility of the deposition process in a range not exceeding 2x10-4.

Keywords

semiconductor laser, laser chip, antireflection coating

Authors

RŮŽIČKA, B., WILFERT, O.

RIV year

2002

Released

9. 9. 2002

Publisher

SPIE-The International Society for Optical Engineering

Location

Washington, USA

ISBN

0-8194-4686-6

Book

Seveth International Symposium on Laser Metrology Applied to Science, Industry, and Everyday Life

Edition number

1

Pages from

352

Pages to

356

Pages count

5

BibTex

@inproceedings{BUT4489,
  author="Bohdan {Růžička} and Otakar {Wilfert}",
  title="Residual Reflectivity of Amplification Media for Extended-Cavity Laser",
  booktitle="Seveth International Symposium on Laser Metrology Applied to Science, Industry, and Everyday Life",
  year="2002",
  number="1",
  pages="5",
  publisher="SPIE-The International Society for Optical Engineering",
  address="Washington, USA",
  isbn="0-8194-4686-6"
}