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OHLÍDAL, I., OHLÍDAL, M., FRANTA, D.
Original Title
Influence of technological conditions on mechanical stresses inside diamond-like carbon films
Type
journal article in Web of Science
Language
English
Original Abstract
The influences of the technological conditions on the values of the intrinsic mechanical stresses inside DLC thin films prepared by PECVD method onto silicon subtrates are studied. These stresses are measured by two-beam interferometry and optical profilometry based on chromatic aberration through the neasurements of deformations of the silicon substrates originating in consequence of the film stresses. It is shown that the influence of the deposition time (i.e film thickness) on the film stress is relatively slight in contrast to the influence of the hydrogen flow rate on this quantity. It is namely shown that the film stresses are influenced by the hydrogen flow rate values in a pronounced way within the the interval 1-7 sccm. Moreover, it is shown that the method of optical profilometry used can be competitive to the method of two-beam interferometry from the practical point of view.
Keywords
Mechanical stress, DLC, Optical methods
Authors
RIV year
2005
Released
1. 11. 2005
Publisher
ELSEVIER SCIENCE SA
Location
LAUSANNE, SWITZERLAND
ISBN
0925-9635
Periodical
Diamond and Related Materials
Year of study
14
Number
11-12
State
Kingdom of the Netherlands
Pages from
1835
Pages to
1838
Pages count
4
BibTex
@article{BUT45891, author="Ivan {Ohlídal} and Miloslav {Ohlídal} and Daniel {Franta} and Vladimír {Čudek} and Vilma {Buršíková} and Petr {Klapetek} and Kateřina {Brillová}", title="Influence of technological conditions on mechanical stresses inside diamond-like carbon films", journal="Diamond and Related Materials", year="2005", volume="14", number="11-12", pages="1835--1838", issn="0925-9635" }