Publication detail

Plasma polymerisation of methylphenylsilane

SALYK, O. BROŽA, P. DOKOUPIL, N. HERRMANN, R. KUŘITKA, I. PRYČEK, J. WEITER, M.

Original Title

Plasma polymerisation of methylphenylsilane

Type

journal article - other

Language

English

Original Abstract

Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resulting thin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates species for layer growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in comparison with RF plasma and the deposition rate is larger in comparison with RF plasma . The inelastic collision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW and RF samples are compared.

Keywords

Polysilane; PMPS; Plasma deposition; Mass spectroscopy

Authors

SALYK, O.; BROŽA, P.; DOKOUPIL, N.; HERRMANN, R.; KUŘITKA, I.; PRYČEK, J.; WEITER, M.

RIV year

2005

Released

27. 9. 2005

Publisher

Elsevier

Location

London

ISBN

0257-8972

Periodical

Surface and Coatings Technology

Year of study

200

Number

1-4

State

Swiss Confederation

Pages from

486

Pages to

489

Pages count

4

BibTex

@article{BUT46370,
  author="Ota {Salyk} and Pavel {Broža} and Norbert {Dokoupil} and Radim {Herrmann} and Ivo {Kuřitka} and Jiří {Pryček} and Martin {Weiter}",
  title="Plasma polymerisation of methylphenylsilane",
  journal="Surface and Coatings Technology",
  year="2005",
  volume="200",
  number="1-4",
  pages="486--489",
  issn="0257-8972"
}