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ČECH, V. STUDÝNKA, J. ČECHALOVÁ, B. MISTRÍK, J. ZEMEK, J.
Original Title
Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD
Type
journal article - other
Language
English
Original Abstract
Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm - 10.5 micron) were analyzed with respect to mechanical, optical, and chemical properties. All the films exhibited a layered structure. The overlayer at the film surface with a thickness (0.9 - 34 nm) dependent on the sample thickness was revealed by AFM, nanoindentation, and ellipsometry. A gradient behavior of the refractive index and the Young's modulus within the overlayer was related to the surface morphology of the films. A gradient interlayer at the substrate was also discussed.
Keywords
Ellipsometry; Fourier transform infrared spectroscopy; Photoelectron spectroscopy; [C] PACVD; [X] Plasma polymerization
Authors
ČECH, V.; STUDÝNKA, J.; ČECHALOVÁ, B.; MISTRÍK, J.; ZEMEK, J.
RIV year
2008
Released
22. 12. 2008
ISBN
0257-8972
Periodical
Surface and Coatings Technology
Year of study
202
Number
22
State
Swiss Confederation
Pages from
5572
Pages to
5575
Pages count
4
BibTex
@article{BUT48292, author="Vladimír {Čech} and Jan {Studýnka} and Božena {Čechalová} and Jan {Mistrík} and Josef {Zemek}", title="Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD", journal="Surface and Coatings Technology", year="2008", volume="202", number="22", pages="5572--5575", issn="0257-8972" }