Publication detail

Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD

ČECH, V. STUDÝNKA, J. ČECHALOVÁ, B. MISTRÍK, J. ZEMEK, J.

Original Title

Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD

Type

journal article - other

Language

English

Original Abstract

Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm - 10.5 micron) were analyzed with respect to mechanical, optical, and chemical properties. All the films exhibited a layered structure. The overlayer at the film surface with a thickness (0.9 - 34 nm) dependent on the sample thickness was revealed by AFM, nanoindentation, and ellipsometry. A gradient behavior of the refractive index and the Young's modulus within the overlayer was related to the surface morphology of the films. A gradient interlayer at the substrate was also discussed.

Keywords

Ellipsometry; Fourier transform infrared spectroscopy; Photoelectron spectroscopy; [C] PACVD; [X] Plasma polymerization

Authors

ČECH, V.; STUDÝNKA, J.; ČECHALOVÁ, B.; MISTRÍK, J.; ZEMEK, J.

RIV year

2008

Released

22. 12. 2008

ISBN

0257-8972

Periodical

Surface and Coatings Technology

Year of study

202

Number

22

State

Swiss Confederation

Pages from

5572

Pages to

5575

Pages count

4

BibTex

@article{BUT48292,
  author="Vladimír {Čech} and Jan {Studýnka} and Božena {Čechalová} and Jan {Mistrík} and Josef {Zemek}",
  title="Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD",
  journal="Surface and Coatings Technology",
  year="2008",
  volume="202",
  number="22",
  pages="5572--5575",
  issn="0257-8972"
}