Publication detail

Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence

ZUPPELLA, P. -LUCIANI, D. -TUCCERI, P. -DeMARCO, P. -GAUDIERI, A. -KAISER, J. -OTTAVIANO, L. -SANTUCCI, S. -REALE, A.

Original Title

Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence

Type

journal article - other

Language

English

Original Abstract

A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration, lambda = 46.9 nm) was successfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), large area (0.1 mm2) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA: polymethylmethacrylate) substrates. The experiments allowed a systematical investigation of the degree of mutual coherence of the source, giving a clear indication that the interference lithography can be pushed down to the ultimate resolution limit of lambda/4.

Keywords

XUV interference litography, capillary-discharge based table-top source

Authors

ZUPPELLA, P. -LUCIANI, D. -TUCCERI, P. -DeMARCO, P. -GAUDIERI, A. -KAISER, J. -OTTAVIANO, L. -SANTUCCI, S. -REALE, A.

RIV year

2009

Released

24. 2. 2009

Publisher

IOP PUBLISHING

ISBN

0957-4484

Periodical

NANOTECHNOLOGY

Year of study

20

Number

2

State

United Kingdom of Great Britain and Northern Ireland

Pages from

115303

Pages to

115307

Pages count

4

BibTex

@article{BUT48533,
  author="Jozef {Kaiser}",
  title="Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence",
  journal="NANOTECHNOLOGY",
  year="2009",
  volume="20",
  number="2",
  pages="115303--115307",
  issn="0957-4484"
}