Photocatalytic Degradation of Formic Acid on TiO2 Thin Layers

journal article - other

English

TiO2 thin films were deposited onto borosilicate glass plates by sol-gel technique using dip-coating and printing methods. Formic acid (FA) was choosen because of simple mechanism of degradation: it undergoes direct mineralisation to CO2 and H2O without the formation of any stable intermediate species. Moreover, it also represents a possible final step in the photodegradation of more complex organic compounds. Photocatalytic activity was evaluated by examining the oxidation rate of formic acid aqueous solution upon UV irradiation in a pyrex cylindric reactor. HPLC analysis was used for detection of FA concentration. The obtained values of initial reaction rate for various FA initial concentrations were treated using Lagmuir-Hinshelwood model. The influence of TiO2 layer number (dip-coating method) and the value of TiO2 dot area (printing method) on the rate of FA photocatalytic degradation were tested.

photoctalytic degradation, formic acid

CHOMOUCKÁ, J.; DZIK, P.; VESELÝ, M.; DRBOHLAVOVÁ, J.

2008

9. 9. 2008

ČSCH

Praha

1213-7103

Chemické listy

102

15

Czech Republic

s986

s988

3

http://www.chemicke-listy.cz/docs/full/2008_15_s983-s1071.pdf