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CHVÁTAL, M. ŠIKULA, J. SEDLÁKOVÁ, V. KNÁPEK, A.
Original Title
Measurements and Theoretical Approximations of VA Characteristics MOSFETs
Type
journal article - other
Language
English
Original Abstract
Experiments were carried out for n-channel CMOS technology. Electron concentration in the channel decreases linearly from the source to the drain contact. Diffusion current component is independent on the x-coordinate and it is equal to the drift current component for the low electric field. Lateral component of the electric field intensity is inhomogeneous in the channel and it has a minimum value near the source contact and increases with the distance from the source to the drain. It reaches maximum value near the drain electrode.
Keywords
VA characteristic, MOSFET, electron density, diffusion current, drift current
Key words in English
Authors
CHVÁTAL, M.; ŠIKULA, J.; SEDLÁKOVÁ, V.; KNÁPEK, A.
RIV year
2009
Released
2. 11. 2009
Publisher
TYPOservis Holešov
Location
Masarykova 650 76901 Holešov
ISBN
0447-6441
Periodical
Jemná mechanika a optika
Year of study
54
Number
10
State
Czech Republic
Pages from
278
Pages to
279
Pages count
2
BibTex
@article{BUT49126, author="Miloš {Chvátal} and Josef {Šikula} and Vlasta {Sedláková} and Alexandr {Knápek}", title="Measurements and Theoretical Approximations of VA Characteristics MOSFETs", journal="Jemná mechanika a optika", year="2009", volume="54", number="10", pages="278--279", issn="0447-6441" }