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OHLÍDAL, I. OHLÍDAL, M. NEČAS, D. FRANTA, D. BURŠÍKOVÁ, V.
Original Title
Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry
Type
journal article in Web of Science
Language
English
Original Abstract
The combined optical method enabling us to perform the complete optical characterisation of weakly absorbing non-uniform thin films is described. This method is based on the combination of standard variable angle spectroscopic ellipsometry, standard spectroscopic reflectometry at near normal incidence and spectroscopic imaging reflectometry applied at normal incidence. The spectral dependences of the optical constants are determined using the non-imaging methods by using the dispersion model based on parametrisation of the density of electronic states. The local thickness distribution is then determined by imaging reflectometry. The method is illustrated by means of the complete optical characterisation of SiOxCyHz thin films.
Keywords
Optical characterisation; Non-uniform films; Spectroscopic ellipsometry; Spectroscopic reflectometry; Spectroscopic imaging reflectometry
Authors
OHLÍDAL, I.; OHLÍDAL, M.; NEČAS, D.; FRANTA, D.; BURŠÍKOVÁ, V.
RIV year
2011
Released
28. 2. 2011
Publisher
ELSEVIER SCIENCE SA
Location
LAUSANNE
ISBN
0040-6090
Periodical
Thin Solid Films
Year of study
519
Number
9
State
Kingdom of the Netherlands
Pages from
2874
Pages to
2876
Pages count
3
BibTex
@article{BUT50347, author="Ivan {Ohlídal} and Miloslav {Ohlídal} and David {Nečas} and Daniel {Franta} and Vilma {Buršíková}", title="Optical characterisation of SiOxCyHz thin films non-uniform in thickness using spectroscopic ellipsometry, spectroscopic reflectometry and spectroscopic imaging reflectometry", journal="Thin Solid Films", year="2011", volume="519", number="9", pages="2874--2876", issn="0040-6090" }