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TRIVEDI, R. ČECH, V.
Original Title
Mechanical properties of plasma polymer film evaluated by conventional and alternative nanoindentation techniques
Type
journal article - other
Language
English
Original Abstract
A plasma-polymerized tetravinylsilane film of about 1 micron thickness was prepared under steady-state deposition conditions on polished silicon wafer using plasma-enhanced chemical vapor deposition. Near-surface mechanical properties such as the reduced modulus and hardness of the plasma polymer film were investigated using conventional depth-sensing nanoindentation as well as load-partial-unload (cyclic) nanoindentation. The study found an influence of the dwell time and loading/unloading rate on the determined values of the reduced modulus, hardness, and contact depth.
Keywords
plasma polymerization; thin films; nanoindentation
Authors
TRIVEDI, R.; ČECH, V.
RIV year
2010
Released
27. 12. 2010
ISBN
0257-8972
Periodical
Surface and Coatings Technology
Year of study
205
Number
Suppl 1
State
Swiss Confederation
Pages from
286
Pages to
289
Pages count
4
BibTex
@article{BUT50758, author="Rutul Rajendra {Trivedi} and Vladimír {Čech}", title="Mechanical properties of plasma polymer film evaluated by conventional and alternative nanoindentation techniques", journal="Surface and Coatings Technology", year="2010", volume="205", number="Suppl 1", pages="286--289", issn="0257-8972" }