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OHLÍDAL, M. OHLÍDAL, I. KLAPETEK, P. NEČAS, D.
Original Title
Complete optical characterization of non-uniform SiOx thin films using imaging spectroscopic reflectometry
Type
abstract
Language
English
Original Abstract
Complete optical characterization of SiOx films non-uniform in thickness is performed using imaging spectroscopic reflectometry (ISR). It is shown that by using this technique it is possible to determine the area distribution of the local thickness (area map) of these films with arbitrary shape of this thickness non-uniformity. Furthermore, it is shown that the SiOx films studied do not exhibit the area non-uniformity in dispersion (material) parameters and optical constants.
Keywords
Thin films, optical parameters
Authors
OHLÍDAL, M.; OHLÍDAL, I.; KLAPETEK, P.; NEČAS, D.
Released
29. 6. 2008
Publisher
Trinity College Dublin
Location
Dublin
Pages from
M-P43
Pages to
Pages count
1