Publication detail

Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures

LOPOUR, F., ŠIKOLA, T., SPOUSTA, J., KALOUSEK, R., MATĚJKA, F., ŠKODA, D.

Original Title

Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures

Type

conference paper

Language

English

Original Abstract

In the paper AFM studies of microstructures etched by ion beams into Si and Au surfaces, and AFM local anodic oxidation of Ti thin films is presented. Using the AFM technique the etching limits of inert atoms in production of silicon and silver grids were found. It was proved that the height of Ti oxide lines fabricated by AFM increases linearly with the voltage between a tip and a sample. On the other hand, the half-width of the lines did not depend linearly on this voltage. The results are useful for studies of quantum effects in nanostructures and experiments in fabrication of nanoelectronic devices (e.g. SET).

Key words in English

AFM fabrication, local anodic oxidation, oxide nanostructures

Authors

LOPOUR, F., ŠIKOLA, T., SPOUSTA, J., KALOUSEK, R., MATĚJKA, F., ŠKODA, D.

RIV year

2001

Released

30. 9. 2001

Publisher

P. Marcus, A. Galtayries, N. Frémy

Location

Avignon, France

Pages from

320

Pages to

320

Pages count

1

BibTex

@inproceedings{BUT6953,
  author="Filip {Lopour} and Tomáš {Šikola} and Jiří {Spousta} and Radek {Kalousek} and František {Matějka} and David {Škoda}",
  title="Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures",
  booktitle="9th European Conference on Applications of Surface and Interface Analysis (ECASIA'01) Book of Abstracts",
  year="2001",
  pages="1",
  publisher="P. Marcus, A. Galtayries, N. Frémy",
  address="Avignon, France"
}