Přístupnostní navigace
E-application
Search Search Close
Publication detail
RAŠKOVÁ, Z., ŠORMOVÁ, H., HAVELKOVÁ, I., KRČMA, F., VANĚK, J., PŘIKRYL, R., ČECH, V.
Original Title
Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films
Type
conference paper
Language
English
Original Abstract
The main part of this work is focused on the identification of the spectra measured during the plasma deposition using the vinyltriethoxysilane in a continual regime and also in a pulsed regime with the varied relative pulse duration and during deposition with an amount of oxygen added in various ratios. The next part is focused on spectroscopic observation during the plasma deposition using the hexamethyldisiloxane and gamma-metacryloxyprophyltrimethoxysilane.
Keywords
Plasma thin layer deposition, organosilicone films, optical emission spectroscopy
Authors
RIV year
2003
Released
25. 6. 2003
Publisher
IUPAC
Location
Taormina
Pages from
1
Pages to
6
Pages count
BibTex
@inproceedings{BUT8829, author="Zuzana {Rašková} and Hana {Šormová} and Iveta {Havelková} and František {Krčma} and Jan {Vaněk} and Radek {Přikryl} and Vladimír {Čech}", title="Spectroscopic Observation of Low Pressure Plasma Deposition of Thin Silane and Siloxane Based Films", booktitle="Proceedings of ISPC XVI", year="2003", number="1", pages="6", publisher="IUPAC", address="Taormina" }