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HOFEREK, L. PÁLESCH, E. ČECH, V.
Original Title
Plasma-polymerized films based on tetravinylsilane monomer
Type
abstract
Language
English
Original Abstract
Plasma-polymerized organosilicones constitute a class of materials with a rich and varied scientific background. This class of materials possesses a special characteristic, which distinguishes it from other plasma polymers – the ability to vary and control the degree of its organic/inorganic character (i.e., the carbon content) and the polymer cross-linking by the appropriate choice of fabrication variables. This allows one to control many physico-chemical properties over wide ranges resulting in an extraordinary potential for useful applications, which are only now beginning to be tapped. The organosilicon plasma polymers are widely recognized for their potential in optical, mechanical, and electronic applications. Mostly hard coatings are developed as protective layers, but we aimed at soft coatings using pulsed plasma. A reduction of plasma energy (power), but operated in several orders of magnitude, enabled us to control chemical composition and structure of plasma polymer coatings resulting in a wide range of mechanical, optical, and surface properties.
Keywords
thin films, PECVD
Authors
HOFEREK, L.; PÁLESCH, E.; ČECH, V.
Released
31. 12. 2011
Pages from
1
Pages to
Pages count
BibTex
@misc{BUT89440, author="Lukáš {Hoferek} and Erik {Pálesch} and Vladimír {Čech}", title="Plasma-polymerized films based on tetravinylsilane monomer", year="2011", pages="1--1", note="abstract" }