Publication detail

Protection by Deposition of Parylene and SiOx Thin Films

BALAŠTÍKOVÁ, R. PROCHÁZKA, M. MENČÍK, P. HORÁK, J. PŘIKRYL, R. KRČMA, F.

Original Title

Protection by Deposition of Parylene and SiOx Thin Films

Type

conference paper

Language

English

Original Abstract

This study focuses on possibilities of the archaeological artefacts (copper, iron, brass and bronze) protection by a thin film deposition of SiOx and Parylene thin films. Parylene coatings are prepared by the standard chemical vapor deposition (CVD) method. SiOx layers were deposited by PECVD in a low pressure reactor with capacitively coupled plasma discharge (13.56 MHz). The coatings were characterized by various methods in order to obtain information about their chemical structure (FTIR) and elemental composition (XPS), surface morphology (SEM) and barrier properties (OTR).

Keywords

thin protective film, parylene layers

Authors

BALAŠTÍKOVÁ, R.; PROCHÁZKA, M.; MENČÍK, P.; HORÁK, J.; PŘIKRYL, R.; KRČMA, F.

RIV year

2012

Released

15. 10. 2012

Location

Brno

ISBN

978-80-210-5979-5

Book

Potential and Applications of Surface Nanotreatment of Polymers and Glass - Book of Abstracts

Pages from

32

Pages to

34

Pages count

3

BibTex

@inproceedings{BUT96892,
  author="Radka {Veverková} and Michal {Procházka} and Přemysl {Menčík} and Jakub {Horák} and Radek {Přikryl} and František {Krčma}",
  title="Protection by Deposition of Parylene and SiOx Thin Films",
  booktitle="Potential and Applications of Surface Nanotreatment of Polymers and Glass - Book of Abstracts",
  year="2012",
  pages="32--34",
  address="Brno",
  isbn="978-80-210-5979-5"
}