Publication detail

Mechanical properties of plasma polymer films controlled by RF power

PÁLESCH, E. KONTÁROVÁ, S. ČECH, V.

Original Title

Mechanical properties of plasma polymer films controlled by RF power

Type

conference paper

Language

English

Original Abstract

This study deals with plasma polymer films deposited on silicon substrates using tetravinylsilane monomer. The deposition technique was plasma-enhanced chemical vapour deposition. Nanoindentation was used as a method to investigate mechanical properties of samples prepared at different RF powers. The Youngs modulus and hardness of thin films were estimated from load-displacement curves. The nanoscratch test was employed to determine the critical normal load needed for film delamination, as a parameter describing adhesion to the substrate. AFM images of scratches were carried out to correlate the data with nature and shape of scratches.

Keywords

Thin films, plasma polymer, mechanical properties, nanoindentation, nanoscratch test

Authors

PÁLESCH, E.; KONTÁROVÁ, S.; ČECH, V.

Released

17. 12. 2012

Pages from

1

Pages to

4

Pages count

4

BibTex

@inproceedings{BUT97296,
  author="Erik {Pálesch} and Soňa {Kontárová} and Vladimír {Čech}",
  title="Mechanical properties of plasma polymer films controlled by RF power",
  booktitle="Proc. 13th Int. Conf. Plasma Surface Engineering",
  year="2012",
  pages="1--4"
}