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PAVELKA, J., SEDLÁKOVÁ, V., ŠIKULA, J., HAVRÁNEK, J., TACANO, M., HASHIGUCHI, S., TOITA, M.
Original Title
RTS in Submicron MOSFETs: High Field Effects
Type
conference paper
Language
English
Original Abstract
A systematic analysis of two level RTS signal was made to obtain information on capture and emission processes as a function of gate voltage, drain current and temperature for low and high lateral electric field.
Key words in English
RTS noise, high electric field, MOSFET, MIS structure
Authors
RIV year
2005
Released
1. 1. 2005
Publisher
University of Salamanca
Location
Salamanka, Španělsko
ISBN
0-7354-0267-1
Book
Noise and Fluctuations, 18th International Conference on Noise and Fluctuations - ICNF 2005, AIP Conference Proceedings 780
Pages from
339
Pages to
342
Pages count
4
BibTex
@inproceedings{BUT16493, author="Jan {Pavelka} and Vlasta {Sedláková} and Josef {Šikula} and Jan {Havránek} and Munecazu {Tacano} and Sumihisa {Hashiguchi} and Masato {Toita}", title="RTS in Submicron MOSFETs: High Field Effects", booktitle="Noise and Fluctuations, 18th International Conference on Noise and Fluctuations - ICNF 2005, AIP Conference Proceedings 780", year="2005", pages="4", publisher="University of Salamanca", address="Salamanka, Španělsko", isbn="0-7354-0267-1" }