Publication detail

Hiding e-beam exposure fields by deterministic 2D pattering

HORÁČEK, M. KNÁPEK, A. MATĚJKA, M. KRÁTKÝ, S. URBÁNEK, M. MIKA, F. KOLAŘÍK, V.

Original Title

Hiding e-beam exposure fields by deterministic 2D pattering

Type

conference paper

Language

English

Original Abstract

The high stability and good current homogeneity in the spot of the e-beam writer is crucial to the exposure quality, particularly in the case of large-area structures when gray-scale lithography is used. Even though the deflection field distortion is calibrated regularly and beam focus and beam astigmatism is dynamically corrected over the entire deflection field, we can observe disturbances in the exposed relief. Recently, we presented a method that makes use of e–beam exposure imperfection by introducing marginally visible high–frequency diffraction gratings of variable pitch that fill in separate orthogonal exposure fields. The actually presented approach follows up our research on aperiodic arrangements of optical primitives, especially on the phyllotactic– like arrangement of sub–micron relief optical elements. This approach is extended from the diffraction element arrangement to the higher level of exposure fields arrangements.

Keywords

phyllotaxis, electron beam lithography

Authors

HORÁČEK, M.; KNÁPEK, A.; MATĚJKA, M.; KRÁTKÝ, S.; URBÁNEK, M.; MIKA, F.; KOLAŘÍK, V.;

Released

4. 6. 2018

ISBN

978-80-87441-23-7

Book

Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar.

Pages from

36

Pages to

36

Pages count

1

BibTex

@inproceedings{BUT165267,
  author="HORÁČEK, M. and KNÁPEK, A. and MATĚJKA, M. and KRÁTKÝ, S. and URBÁNEK, M. and MIKA, F. and KOLAŘÍK, V.",
  title="Hiding e-beam exposure fields by deterministic 2D pattering",
  booktitle="Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Proceedings of the 16th International Seminar.",
  year="2018",
  pages="36--36",
  isbn="978-80-87441-23-7"
}