Preparation of Silver and Gold Nanoparticles by the Pin-Hole DC Plasma System

journal article in Web of Science

English

Silver and gold nanoparticles were produced using the pin-hole discharge generated by dc non-pulsing high voltage directly in precursor solution. Silver nitrate solution was used as the precursor for silver nanoparticles, chloroauric acid was used as the precursor for gold nanoparticles. Effects of discharge time, precursor concentration and additives such as reduction agent (ethylene glycol) and capping agent (polyethylene glycol and sucrose) were studied. Nanoparticles were mainly analysed by the UV-VIS spectrometry. The size of prepared nanoparticles was determined by the dynamic light scattering with the backscattering detection. To determine stability of nanoparticles Zeta potential was measured by the electrophoretic light scattering. It was found that the absorption maximum of nanoparticles increases with time of the discharge treatment and concentration of the precursor. The size of silver nanoparticles ranged from 10 nm to 1000 nm and final solution had higher polydispersity. The size of Au nanoparticles ranged from 10 to 100 nm, depending on the precursor concentration. The most stable particles were prepared from the pure precursor solution without any additives. Addition of ethylene glycol stimulated the reduction process of nanoparticles from the solution, but it decreased their Zeta potential. Final particles were less stable, started to form larger structures that tended to sediment. Added capping agent decreased input of power needed for the stable discharge operation. Formation of silver and gold nanoparticles was further confirmed by the scanning electron microscopy with energy dispersion spectrometer. Both silver and gold particles had spherical shapes.

plasma in liquids, pin-hole discharge, nanoparticles, silver, gold, ethylene glycol, sucrose, UV-VIS spectrometry, dynamic light scattering, Zeta potential, SEM, EDS

ČECHOVÁ, L.; KRČMA, F.; KALINA, M.; MAN, O.; KOZÁKOVÁ, Z.

17. 6. 2021

0021-8979

Journal of Aplied Physics

129

14

United States of America

233304-1

233304-9

9

https://aip.scitation.org/doi/pdf/10.1063/5.0044054