Publication detail

Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures

KELAROVÁ, Š. PŘIBYL, R. HOMOLA, V. POLČÁK, J. CHARVÁTOVÁ CAMPBELL, A. HAVLÍČEK, M. VRCHOVECKA, K. VÁCLAVÍK, R. ZÁBRANSKÝ, L. BURŠÍKOVÁ, V.

Original Title

Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures

Type

journal article in Web of Science

Language

English

Original Abstract

Capacitively coupled RF glow discharge was used to form novel coatings of SiOxCyHz using varying proportions of trimethylsilyl acetate (TMSAc) monomer and the carrier gas argon. The properties of the TMSAc-based plasma polymers produced depend significantly on the proportion of argon in TMSAc/Ar gaseous mixture, which ranged from 0 % to 75 %. Reaction mixtures containing less than 50 % Ar produced hydrophobic polymers, for which the indentation hardness values were less than 1.5 GPa. Seventy-five percent argon in the reaction mixture yielded a crosslinked carbon-rich organosilicon structure with a hardness of 6 GPa. As many applications require good stability in a liquid environment, the TMSAc-based coatings were immersed in phosphate buffered saline (PBS) for 14 days. Because any material used in a medical application must be resistant to the techniques used for sterilization, the prepared coatings were subjected to a standard sterilization procedure using UVC radiation. A degree of the structural changes induced by both environments corresponded to the argon ratio used for production of thin films. Possible degradation mechanisms were examined and discussed. Using 7.7-21.4 % Ar during the deposition process led to the TMSAc-based plasma polymers exhibiting good resistance to the prolonged immersion in PBS and UVC sterilization.

Keywords

Trimethylsilyl acetate; PECVD; Low pressure RF glow discharge; Plasma polymers; Stability

Authors

KELAROVÁ, Š.; PŘIBYL, R.; HOMOLA, V.; POLČÁK, J.; CHARVÁTOVÁ CAMPBELL, A.; HAVLÍČEK, M.; VRCHOVECKA, K.; VÁCLAVÍK, R.; ZÁBRANSKÝ, L.; BURŠÍKOVÁ, V.

Released

1. 1. 2023

Publisher

PERGAMON-ELSEVIER SCIENCE LTD

Location

OXFORD

ISBN

1879-2715

Periodical

VACUUM

Year of study

207

Number

1

State

United Kingdom of Great Britain and Northern Ireland

Pages count

12

URL

https://www.sciencedirect.com/science/article/pii/S0042207X22007564?via%3Dihub

BibTex

@article{BUT187376,
  author="KELAROVÁ, Š. and PŘIBYL, R. and HOMOLA, V. and POLČÁK, J. and CHARVÁTOVÁ CAMPBELL, A. and HAVLÍČEK, M. and VRCHOVECKA, K. and VÁCLAVÍK, R. and ZÁBRANSKÝ, L. and BURŠÍKOVÁ, V.",
  title="Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures",
  journal="VACUUM",
  year="2023",
  volume="207",
  number="1",
  pages="12",
  doi="10.1016/j.vacuum.2022.111634",
  issn="1879-2715",
  url="https://www.sciencedirect.com/science/article/pii/S0042207X22007564?via%3Dihub"
}