Publication detail

Pulse power supply for magnetron sputtering.

J.Boušek

Original Title

Pulse power supply for magnetron sputtering.

Type

conference paper

Language

English

Original Abstract

An experimental pulse power supply source for magnetron pulse sputtering has been designed and built. The mean power is 750 W with peak power capability up to 3 kW. The testing was performed on the own design magnetron sputtering device with good cooling capability. Cathode voltage and cathode current were recorded during both ON-Pulse and OFF-Pulse. This monitoring of the target current and voltage shows that transient spikes occur and the waveforms differ from idealized behavior. The voltage spike at the beginning of the ON-Pulse brings high energy electrons into the magnetron discharge. Because the discharge current is low in the starting part of the ON-Pulse species created in this time are supposed to be more favorable for the generation of radicals than for sputtering. During the Off-Pulse the discharge current first decays rapidly and later more slowly to zero, but it is not falling to zero completely when the Off-Pulse is shorter than 10 μs about. This two-step decay of the magnetron current indicates the presence of two groups of electrons in magnetron plasma. There are fast electrons generated by electric field and bulk electrons confined in the plasma volume.

Keywords

Pulse power supply; magnetron sputtering; electron energy.

Authors

J.Boušek

RIV year

2005

Released

21. 9. 2005

Publisher

Nakl. Novotný

Location

Brno

ISBN

80-214-3042-7

Book

Socrates Workshop

Pages from

163

Pages to

168

Pages count

6

BibTex

@inproceedings{BUT20661,
  author="Jaroslav {Boušek}",
  title="Pulse power supply for magnetron sputtering.",
  booktitle="Socrates Workshop",
  year="2005",
  pages="6",
  publisher="Nakl. Novotný",
  address="Brno",
  isbn="80-214-3042-7"
}