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Ondřej Hégr, Jaroslav Boušek, Jaroslav Sobota, Radim Bařinka, Aleš Poruba
Original Title
Reactive Magnetron Sputtering for Passivation of Solar Cells
Type
conference paper
Language
English
Original Abstract
We use magnetron sputtering to create of passivation films on the surface of photovoltaic solar cells. For the passivation layer created by this technology is characteristic the high deposition rate with relatively precise layer thickness control.. By reactive magnetron sputtering we deposited the materials currently used in the photovoltaic industry, the SiN (Silicon Nitrid) and SiO2, next the AlN and Al2O3. The aim of work is evaluation of both surface recombination and optical properties of this layers and their comparison with standard solar cells made by Solartec company (Czech republic.
Keywords
magnetron sputtering, passivation layers, solar cells
Authors
RIV year
2006
Released
1. 1. 2006
Publisher
nakl. Z. Novotný
ISBN
80-214-3246-2
Book
IMAPS CS International Conference 2006, Proceedings
Edition number
1
Pages from
526
Pages to
529
Pages count
4
BibTex
@inproceedings{BUT24907, author="Ondřej {Hégr} and Jaroslav {Boušek} and Jaroslav {Sobota} and Radim {Bařinka} and Aleš {Poruba}", title="Reactive Magnetron Sputtering for Passivation of Solar Cells", booktitle="IMAPS CS International Conference 2006, Proceedings", year="2006", volume="2006", number="1", pages="4", publisher="nakl. Z. Novotný", isbn="80-214-3246-2" }